R&D Activities
- Conferences - Solder joint reliability of middle P% and high P% Ni/Au with low melting point solder containing Indium Speaker :Mutsumi Komeyama - Dates : Oct.19(Sun), 2025 - Oct.23(Thu), 2025 - Organaizer : The Surface Mount Technology Association - Conference : SMTA International 
- Conferences - Electrolytic copper plating process for glass substrate Speaker :Raihei Ikumoto - Dates : May.27(Tue), 2025 - May.30(Fri), 2025 - Organaizer : IEEE - Conference : Electronic Components and Technologies Conference (ECTC) 
Past Activities
- Investigation of the effects of various factors within steps of SAP process to nanovoids in the interface between electroless copper layer and inner layer copper by STEM analysis Speaker :Kanji Matsumoto - Dates :Sep.30(Mon), 2024 - Oct.03(Thu), 2024 - Organaizer :International Microelectronics Assembly & Packaging Society - Conference :IMAPS 
- The intermediate diffusion barrier performance of electroless Co-W-B / Ni-P stacked deposits between Cu and solder joint Speaker :Yoshihito Ii - Dates :Oct.09(Mon), 2023 - Oct.12(Thu), 2023 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Effect of Tafel Slope on the Difference Deposition Rate at 2CD(Circle Diameter) Wafer Speaker :Atsunobu Akita - Dates :Apr.19(Wed), 2023 - Apr.22(Sat), 2023 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :International Conference on Electronics Packaging (ICEP) 
- Investigation of acidic pretreatment process with superior adhesion between Al material and electroless deposit Speaker :Takuma Maekawa - Dates :Feb.14(Tue), 2023 - Feb.16(Thu), 2023 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Solder/solder joint for low temperature reflow by multi plating method Speaker :Hiroki Nakano - Dates :Feb.14(Tue), 2023 - Feb.16(Thu), 2023 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Evaluation of reliability using autocatalytic silver bath on ENEP layer Speaker :Naoshi Nishimura - Dates :Oct.31(Mon), 2022 - Nov.03(Thu), 2022 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Investigation of electroless copper plating with high plating coverage in small BVH for next generation fine pattern SAP Speaker :Shinichiro Yoshida - Dates :Oct.04(Tue), 2022 - Oct.06(Thu), 2022 - Organaizer :International Microelectronics Assembly & Packaging Society - Conference :IMAPS 
- Barrier Properties of Electroless CoWB Deposits under High Temperature Speaker :Tetsuya Sasamura - Dates :Sep.05(Mon), 2022 - Sep.07(Wed), 2022 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Solder/solder Joint for Low Temperature Reflow by Multi Plating Method Speaker :Yoichi Maruo - Dates :May.11(Wed), 2022 - May.13(Fri), 2022 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :International Conference on Electronics Packaging (ICEP) 
- The Investigation of filling performance for various size of through-hole on the additives of electrolytic copper plating Speaker :Ryo Manabe - Dates :Mar.23(Wed), 2022 - Mar.25(Fri), 2022 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :Lecture meeting 
- Investigation of Pd-Ge alloy in ENEPIG process as better barrier layer Speaker :Yohei Kaneko - Dates :Nov.01(Mon), 2021 - Nov.04(Thu), 2021 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Characterization of Formaldehyde-free electro-less copper plating for SAP Speaker :Masaharu Takeuchi - Dates :Oct.11(Mon), 2021 - Oct.14(Thu), 2021 - Organaizer :International Microelectronics Assembly & Packaging Society - Conference :IMAPS 
- The effect of the W concentration in the electroless Co-W-B bath to the deposits Speaker :Yoshihito Ii - Dates :Sep.20(Mon), 2021 - Sep.22(Wed), 2021 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Investigation of Factors Affecting Pillar Top Morphology and Height Uniformity Speaker :Naohide Akamatsu - Dates :Sep.06(Mon), 2021 - Sep.08(Wed), 2021 - Organaizer :International Union for Surface Finishing (IUSF) /The Surface Finishing Society of Japan (SFJ) - Conference :INTERFINISH 
- Surface finishing for radio frequency applications Speaker :Naoshi Nishimura - Dates :Sep.06(Mon), 2021 - Sep.08(Wed), 2021 - Organaizer :International Union for Surface Finishing (IUSF) /The Surface Finishing Society of Japan (SFJ) - Conference :INTERFINISH 
- Evaluation of Direct Metallization Technology Plating Properties with Excellent Material Selectivity Speaker :Takuya Komeda - Dates :May.12(Wed), 2021 - May.14(Fri), 2021 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :International Conference on Electronics Packaging (ICEP) 
- Characterization of Formaldehyde-free electro-less copper plating for SAP Speaker :Masaharu Takeuchi - Dates :Mar.17(Wed), 2021 - Mar.19(Fri), 2021 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :Lecture meeting 
- Deposit properties of electroless Au/Pd/Au process for 5G application Speaker :Tetsuya Sasamura - Dates :Sep.28(Mon), 2020 - Oct.23(Fri), 2020 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Characterization of Formaldehyde-free electro-less copper plating for SAP Speaker :Masaharu Takeuchi - Dates :Oct.13(Tue), 2020 - Oct.14(Wed), 2020 - Organaizer :International Wafer-Level Packaging Conference - Conference :IWLPC 
- Optimization of High-Speed Electrolytic Plating of Copper Pillar to Achieve a Flat Top Morphology and Height Uniformity Speaker :Raihei Ikumoto - Dates :Oct.05(Mon), 2020 - Oct.08(Thu), 2020 - Organaizer :International Microelectronics Assembly & Packaging Society - Conference :IMAPS 
- The effect of B contents on structure and barrier properties of Co-W-B deposit Speaker :Yoshihito Ii - Dates :Sep.17(Thu), 2020 - Sep.18(Fri), 2020 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Evaluation of Direct Metallization Technology Plating Properties with Excellent Material Selectivity Speaker :Takuya Komeda - Dates :Sep.22(Sun), 2019 - Sep.26(Thu), 2019 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Evaluation of Barrier Properties of Electroless Co-W-B Deposited Film Speaker :Yoshihito Ii - Dates :Sep.12(Thu), 2019 - Sep.13(Fri), 2019 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Barrier properties of electroless deposit of Co-W-P alloy Speaker :Sho Kanzaki - Dates :Apr.17(Wed), 2019 - Apr.20(Sat), 2019 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :International Conference on Electronics Packaging (ICEP) 
- Evaluation of Direct Metallization Technology Plating Properties with Excellent Material Selectivity Speaker :Takuya Komeda - Dates :Mar.11(Mon), 2019 - Mar.13(Wed), 2019 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :Lecture meeting 
- Evaluation of high speed plating for copper post with flat top shape and improved post height uniformity Speaker :Yuki Itakura - Dates :Oct.14(Sun), 2018 - Oct.18(Thu), 2018 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Evaluation of barrier properties of electroless Co-W-P plating film Speaker :Sho Kanzaki - Dates :Sep.06(Thu), 2018 - Sep.07(Fri), 2018 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Characterization of Electro-less Copper Plating with Improved Plating Deposition in Via Hole Speaker :Masaharu Takeuchi - Dates :Mar.06(Tue), 2018 - Mar.08(Thu), 2018 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :Lecture meeting 
- Deposit properties of new electroless Au/Pd/Au process for fine line application Speaker :Tatsushi Someya - Dates :Feb.05(Mon), 2018 - Feb.08(Thu), 2018 - Organaizer :The Surface Mount Technology Association - Conference :SMTA Pan Pacific 
- Characteristics of new electroless Au/Pd/Au process for fine line application Speaker :Tetsuya Sasamura - Dates :Sep.17(Sun), 2017 - Sep.21(Thu), 2017 - Organaizer :The Surface Mount Technology Association - Conference :SMTA International 
- Electromigration evaluation of ENEPIG (Electroless Ni/Pd/Au) deposit Speaker :Fuminori Shibayama - Dates :Aug.29(Tue), 2017 - Aug.30(Wed), 2017 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Electromigration evaluation of ENEPIG plating film Speaker :Tetsuya Sasamura - Dates :Sep.08(Thu), 2016 - Sep.09(Fri), 2016 - Organaizer :The Japan Institute of Electronics Packaging (JIEP) - Conference :MES 
- Consideration of Causes and Countermeasures for Difference in Acid Copper Plating Thickness Between Different Diameter Vias First author :Atsunobu Tanimoto - Journal :The Surface Finishing Society of Japan - Volume :75,(11) - Pages :517-520 
- Factors Affecting Pillar Top Morphology and Height Uniformity on High Speed Copper Electroplating First author :Keita Taniguchi - Journal :The Surface Finishing Society of Japan - Volume :73,(7) - Pages :349-352 
- The solder Joint Reliability of Electroless Surface Finish for Diversified Electronic Components First author :Yukinori Oda - Journal :Japan Welding Society - Volume :91, (3) - Pages :181-185 
- Final Finishing for High Speed Data Communication First author :Shinsuke Wada - Journal :The Surface Finishing Society of Japan - Volume :72,(7) - Pages :377-380 
- Optimization of High-Speed Electrolytic Plating of Copper Pillar to Achieve a Flat Top Morphology and Height Uniformity First author :Raihei Ikumoto - Journal :Journal of Microelectronics and Electronic Packaging - Volume :18, (1) - Pages :7-11 
- Electroplating Equipment for Micro-Chip Components First author :Kouji Shimizu - Journal :The Surface Finishing Society of Japan - Volume :70,(10) - Pages :519-521 
- Behavior of Hydrogen in Electrolessly Deposited Ni/Au and Ni/Pd/Au Films First author :Yukinori Oda - Journal :The Surface Finishing Society of Japan - Volume :70,(3) - Pages :163-167 
- Influence of Hydrogen in Electrolessly Deposited Ni-P/Au Films on Solder Wettability First author :Yukinori Oda - Journal :The Surface Finishing Society of Japan - Volume :69,(9) - Pages :415-417 
- Hydrogen in Electrolessly Deposited Pure Pd and Pd-P Films First author :Yukinori Oda - Journal :The Surface Finishing Society of Japan - Volume :69,(7) - Pages :308-309 
- Intermetallic Compound Growth between Electroless Nickel/Electroless Palladium/Immersion Gold Surface Finish and Sn-3.5Ag or Sn-3.0Ag-0.5Cu Solder First author :Yukinori Oda - Journal :Journal of Electronic Materials - Volume :47,(4) - Pages :2507-2511 
- Current Situation of Final Finish Focusing on Electroless Gold Bath First author :Tsuyoshi Maeda - Journal :The Surface Finishing Society of Japan - Volume :68,(9) - Pages :498-502 
- Auto-Chemical Controller and Analysis of Precious Metal Solution First author :Shinji Ishimaru - Journal :The Surface Finishing Society of Japan - Volume :67,(11) - Pages :572-574 
- Recent Trends of Electroless Copeer Plating First author :Tomoharu Nakayama - Journal :The Surface Finishing Society of Japan - Volume :66,(11) - Pages :496-498 
- Recent Trend of Electroless Palladium Plating First author :Yukinori Oda - Journal :The Surface Finishing Society of Japan - Volume :66,(10) - Pages :453-457 
- The Effect of Some Kinds of Final Finishing Deposit on Wire Bonding Reliability First author :Tatsushi Someya - Journal :The Surface Finishing Society of Japan - Volume :66,(2) - Pages :54-57